United States vs United States: Co-patenting at the EPO according to applicants'/inventors' country
United States
30,174 Number
in 2013
United States
30,174 Number
in 2013
United States rank
1st
United States rank
1st
Co-patenting at the EPO according to applicants'/inventors' country over time
- United States
- United States
How they compare
United States currently reports 30,174 Number against 30,174 Number in United States, a difference of 0 Number.
Across all 37 years both countries report, United States has been ahead every year.
United States ranks 1st and United States ranks 1st of 60 countries.
Head to head by decade
| Decade | United States | United States | Difference | Ahead |
|---|---|---|---|---|
| 1970s | 3,098 Number | 3,098 Number | 0 Number | — |
| 1980s | 11,554 Number | 11,554 Number | 0 Number | — |
| 1990s | 23,054 Number | 23,054 Number | 0 Number | — |
| 2000s | 34,151 Number | 34,151 Number | 0 Number | — |
| 2010s | 32,178 Number | 32,178 Number | 0 Number | — |
Averages of every year both report within each decade.
Frequently asked questions
- Which has higher co-patenting at the epo according to applicants'/inventors' country, United States or United States?
- United States, at 30,174 Number against 30,174 Number in United States as of 2013.
- What is the difference in co-patenting at the epo according to applicants'/inventors' country between United States and United States?
- 0 Number, with United States ahead.
- How many years of comparable data are there for United States and United States?
- 37 years are reported by both, from 1977 to 2013.
- How do United States and United States rank globally for co-patenting at the epo according to applicants'/inventors' country?
- United States ranks 1st and United States ranks 1st of 60 countries.
- Where does this data come from?
- Eurostat, published as Co-patenting at the EPO according to applicants'/inventors' country of residence - number (1977-2013). Statizoid refreshes it automatically from the source and publishes the full history for both places.