Hungary vs New Zealand: High-tech patent applications to the EPO by priority year
Hungary
42.63 Number
in 2013
New Zealand
18.74 Number
in 2013
Hungary rank
32nd
New Zealand rank
36th
High-tech patent applications to the EPO by priority year over time
- Hungary
- New Zealand
How they compare
Hungary currently reports 42.63 Number against 18.74 Number in New Zealand, a difference of 23.89 Number.
That makes Hungary's figure about 2.3 times New Zealand's.
The two have swapped places 8 times across 33 shared years of data; in 1979 it was Hungary ahead.
Hungary ranks 32nd and New Zealand ranks 36th of 60 countries.
Across the 5 decades both report, Hungary averaged higher in 3 and New Zealand in 2.
Head to head by decade
| Decade | Hungary | New Zealand | Difference | Ahead |
|---|---|---|---|---|
| 1970s | 3 Number | 1 Number | 2 Number | Hungary |
| 1980s | 7.03 Number | 2.58 Number | 4.45 Number | Hungary |
| 1990s | 8.53 Number | 12.6 Number | 4.06 Number | New Zealand |
| 2000s | 32.51 Number | 36.9 Number | 4.39 Number | New Zealand |
| 2010s | 53.27 Number | 27.84 Number | 25.44 Number | Hungary |
Averages of every year both report within each decade.
Frequently asked questions
- Which has higher high-tech patent applications to the epo by priority year, Hungary or New Zealand?
- Hungary, at 42.63 Number against 18.74 Number in New Zealand as of 2013.
- What is the difference in high-tech patent applications to the epo by priority year between Hungary and New Zealand?
- 23.89 Number, with Hungary ahead.
- How many years of comparable data are there for Hungary and New Zealand?
- 33 years are reported by both, from 1979 to 2013.
- How do Hungary and New Zealand rank globally for high-tech patent applications to the epo by priority year?
- Hungary ranks 32nd and New Zealand ranks 36th of 60 countries.
- Where does this data come from?
- Eurostat, published as High-tech patent applications to the EPO by priority year (1977-2013). Statizoid refreshes it automatically from the source and publishes the full history for both places.