Italy vs Switzerland: High-tech patent applications to the EPO by priority year and other
Italy
153.69 Number
in 2012
Switzerland
150.95 Number
in 2012
Italy rank
11th
Switzerland rank
12th
High-tech patent applications to the EPO by priority year and other over time
- Italy
- Switzerland
How they compare
Italy currently reports 153.69 Number against 150.95 Number in Switzerland, a difference of 2.74 Number.
The two have swapped places 5 times across 36 shared years of data; in 1977 it was Switzerland ahead.
Italy ranks 11th and Switzerland ranks 12th of 35 countries.
Across the 5 decades both report, Italy averaged higher in 4 and Switzerland in 1.
Head to head by decade
| Decade | Italy | Switzerland | Difference | Ahead |
|---|---|---|---|---|
| 1970s | 13.08 Number | 26.98 Number | 13.89 Number | Switzerland |
| 1980s | 84.51 Number | 76.59 Number | 7.92 Number | Italy |
| 1990s | 183 Number | 111.1 Number | 71.91 Number | Italy |
| 2000s | 306.71 Number | 220.47 Number | 86.24 Number | Italy |
| 2010s | 196.02 Number | 168.16 Number | 27.86 Number | Italy |
Averages of every year both report within each decade.
Frequently asked questions
- Which has higher high-tech patent applications to the epo by priority year and other, Italy or Switzerland?
- Italy, at 153.69 Number against 150.95 Number in Switzerland as of 2012.
- What is the difference in high-tech patent applications to the epo by priority year and other between Italy and Switzerland?
- 2.74 Number, with Italy ahead.
- How many years of comparable data are there for Italy and Switzerland?
- 36 years are reported by both, from 1977 to 2012.
- How do Italy and Switzerland rank globally for high-tech patent applications to the epo by priority year and other?
- Italy ranks 11th and Switzerland ranks 12th of 35 countries.
- Where does this data come from?
- Eurostat, published as High-tech patent applications to the EPO by priority year and other typologies (1977-2012). Statizoid refreshes it automatically from the source and publishes the full history for both places.