Estonia vs Tanzania: Patent applications, nonresidents
Estonia
1
in 2021
Tanzania
1
in 2015
Estonia rank
146th
Tanzania rank
146th
Patent applications, nonresidents over time
- Estonia
- Tanzania
How they compare
Estonia currently reports 1 against 1 in Tanzania, a difference of 0.
Across all 14 years both countries report, Estonia has been ahead every year.
Estonia ranks 146th and Tanzania ranks 146th of 150 countries.
Estonia has averaged higher in every one of the 2 decades both report.
Head to head by decade
| Decade | Estonia | Tanzania | Difference | Ahead |
|---|---|---|---|---|
| 2000s | 239.22 | 2.78 | 236.44 | Estonia |
| 2010s | 11.4 | 2.2 | 9.2 | Estonia |
Averages of every year both report within each decade.
Frequently asked questions
- Which has higher patent applications, nonresidents, Estonia or Tanzania?
- Estonia, at 1 against 1 in Tanzania as of 2021.
- What is the difference in patent applications, nonresidents between Estonia and Tanzania?
- 0, with Estonia ahead.
- How many years of comparable data are there for Estonia and Tanzania?
- 14 years are reported by both, from 2001 to 2015.
- How do Estonia and Tanzania rank globally for patent applications, nonresidents?
- Estonia ranks 146th and Tanzania ranks 146th of 150 countries.
- Where does this data come from?
- WIPO Patent Report: Statistics on Worldwide Patent Activity, World Intellectual Property Organization (WIPO), note: The International Bureau of WIPO assumes no responsibility with respect to the trans, published as Patent applications, nonresidents. Statizoid refreshes it automatically from the source and publishes the full history for both places.
Individual pages
About this data
Patent applications are worldwide patent applications filed through the Patent Cooperation Treaty procedure or with a national patent office for exclusive rights for an invention--a product or process that provides a new way of doing something or offers a new technical solution to a problem. A patent provides protection for the invention to the owner of the patent for a limited period, generally 20 years.