Iceland vs New Zealand: Patent applications to the EPO by priority year by institutional
Iceland
13.58 Number
in 2011
New Zealand
13.57 Number
in 2012
Iceland rank
43rd
New Zealand rank
44th
Patent applications to the EPO by priority year by institutional over time
- Iceland
- New Zealand
How they compare
Iceland currently reports 13.58 Number against 13.57 Number in New Zealand, a difference of 0.01 Number.
Across all 32 years both countries report, New Zealand has been ahead every year.
Iceland ranks 43rd and New Zealand ranks 44th of 61 countries.
New Zealand has averaged higher in every one of the 5 decades both report.
Head to head by decade
| Decade | Iceland | New Zealand | Difference | Ahead |
|---|---|---|---|---|
| 1970s | 0.5 Number | 8.5 Number | 8 Number | New Zealand |
| 1980s | 2.01 Number | 19.83 Number | 17.82 Number | New Zealand |
| 1990s | 10.75 Number | 57.64 Number | 46.89 Number | New Zealand |
| 2000s | 25.77 Number | 144.39 Number | 118.62 Number | New Zealand |
| 2010s | 13.33 Number | 109.53 Number | 96.2 Number | New Zealand |
Averages of every year both report within each decade.
Frequently asked questions
- Which has higher patent applications to the epo by priority year by institutional, Iceland or New Zealand?
- Iceland, at 13.58 Number against 13.57 Number in New Zealand as of 2011.
- What is the difference in patent applications to the epo by priority year by institutional between Iceland and New Zealand?
- 0.01 Number, with Iceland ahead.
- How many years of comparable data are there for Iceland and New Zealand?
- 32 years are reported by both, from 1979 to 2011.
- How do Iceland and New Zealand rank globally for patent applications to the epo by priority year by institutional?
- Iceland ranks 43rd and New Zealand ranks 44th of 61 countries.
- Where does this data come from?
- Eurostat, published as Patent applications to the EPO by priority year by institutional sector (1977-2012). Statizoid refreshes it automatically from the source and publishes the full history for both places.