Liechtenstein vs Slovakia: Patent applications to the EPO by priority year by institutional
Liechtenstein
10.83 Number
in 2012
Slovakia
12.9 Number
in 2012
Liechtenstein rank
49th
Slovakia rank
45th
Patent applications to the EPO by priority year by institutional over time
- Liechtenstein
- Slovakia
How they compare
Slovakia currently reports 12.9 Number against 10.83 Number in Liechtenstein, a difference of 2.07 Number.
That makes Slovakia's figure about 1.2 times Liechtenstein's.
The two have swapped places 3 times across 21 shared years of data; in 1992 it was Liechtenstein ahead.
Liechtenstein ranks 49th and Slovakia ranks 45th of 61 countries.
Across the 3 decades both report, Liechtenstein averaged higher in 2 and Slovakia in 1.
Head to head by decade
| Decade | Liechtenstein | Slovakia | Difference | Ahead |
|---|---|---|---|---|
| 1990s | 19.08 Number | 4.7 Number | 14.38 Number | Liechtenstein |
| 2000s | 24.35 Number | 20.44 Number | 3.92 Number | Liechtenstein |
| 2010s | 23.46 Number | 26.49 Number | 3.03 Number | Slovakia |
Averages of every year both report within each decade.
Frequently asked questions
- Which has higher patent applications to the epo by priority year by institutional, Liechtenstein or Slovakia?
- Slovakia, at 12.9 Number against 10.83 Number in Liechtenstein as of 2012.
- What is the difference in patent applications to the epo by priority year by institutional between Liechtenstein and Slovakia?
- 2.07 Number, with Slovakia ahead.
- How many years of comparable data are there for Liechtenstein and Slovakia?
- 21 years are reported by both, from 1992 to 2012.
- How do Liechtenstein and Slovakia rank globally for patent applications to the epo by priority year by institutional?
- Liechtenstein ranks 49th and Slovakia ranks 45th of 61 countries.
- Where does this data come from?
- Eurostat, published as Patent applications to the EPO by priority year by institutional sector (1977-2012). Statizoid refreshes it automatically from the source and publishes the full history for both places.