Latvia vs Liechtenstein: Patent applications to the EPO by priority year … international
Latvia
9.91 Number
in 2013
Liechtenstein
8.38 Number
in 2013
Latvia rank
46th
Liechtenstein rank
48th
Patent applications to the EPO by priority year … international over time
- Latvia
- Liechtenstein
How they compare
Latvia currently reports 9.91 Number against 8.38 Number in Liechtenstein, a difference of 1.53 Number.
That makes Latvia's figure about 1.2 times Liechtenstein's.
The two have swapped places 7 times across 20 shared years of data; in 1991 it was Liechtenstein ahead.
Latvia ranks 46th and Liechtenstein ranks 48th of 60 countries.
Across the 3 decades both report, Latvia averaged higher in 1 and Liechtenstein in 2.
Head to head by decade
| Decade | Latvia | Liechtenstein | Difference | Ahead |
|---|---|---|---|---|
| 1990s | 1.16 Number | 5.98 Number | 4.82 Number | Liechtenstein |
| 2000s | 4.09 Number | 6.95 Number | 2.85 Number | Liechtenstein |
| 2010s | 6.65 Number | 6.27 Number | 0.3825 Number | Latvia |
Averages of every year both report within each decade.
Frequently asked questions
- Which has higher patent applications to the epo by priority year by international, Latvia or Liechtenstein?
- Latvia, at 9.91 Number against 8.38 Number in Liechtenstein as of 2013.
- What is the difference in patent applications to the epo by priority year by international between Latvia and Liechtenstein?
- 1.53 Number, with Latvia ahead.
- How many years of comparable data are there for Latvia and Liechtenstein?
- 20 years are reported by both, from 1991 to 2013.
- How do Latvia and Liechtenstein rank globally for patent applications to the epo by priority year by international?
- Latvia ranks 46th and Liechtenstein ranks 48th of 60 countries.
- Where does this data come from?
- Eurostat, published as Patent applications to the EPO by priority year by international patent classification (IPC) sections and classes (1977-2012). Statizoid refreshes it automatically from the source and publishes the full history for both places.