Estonia vs Manner-Suomi: Patent applications to the EPO by priority year … NUTS 1977-2013
Estonia
1.81 Number
in 2012
Manner-Suomi
113.02 Number
in 2012
Estonia rank
36th
Manner-Suomi rank
38th
Patent applications to the EPO by priority year … NUTS 1977-2013 over time
- Estonia
- Manner-Suomi
How they compare
Manner-Suomi currently reports 113.02 Number against 1.81 Number in Estonia, a difference of 111.21 Number.
That makes Manner-Suomi's figure about 62.4 times Estonia's.
Across all 18 years both countries report, Manner-Suomi has been ahead every year.
Estonia ranks 36th and Manner-Suomi ranks 38th of 41 countries.
Manner-Suomi has averaged higher in every one of the 3 decades both report.
Head to head by decade
| Decade | Estonia | Manner-Suomi | Difference | Ahead |
|---|---|---|---|---|
| 1990s | 1.08 Number | 81.78 Number | 80.7 Number | Manner-Suomi |
| 2000s | 3.48 Number | 107.33 Number | 103.85 Number | Manner-Suomi |
| 2010s | 1.98 Number | 106.77 Number | 104.79 Number | Manner-Suomi |
Averages of every year both report within each decade.
Frequently asked questions
- Which has higher patent applications to the epo by priority year by nuts 3 region, Estonia or Manner-Suomi?
- Manner-Suomi, at 113.02 Number against 1.81 Number in Estonia as of 2012.
- What is the difference in patent applications to the epo by priority year by nuts 3 region between Estonia and Manner-Suomi?
- 111.21 Number, with Manner-Suomi ahead.
- How many years of comparable data are there for Estonia and Manner-Suomi?
- 18 years are reported by both, from 1992 to 2012.
- How do Estonia and Manner-Suomi rank globally for patent applications to the epo by priority year by nuts 3 region?
- Estonia ranks 36th and Manner-Suomi ranks 38th of 41 countries.
- Where does this data come from?
- Eurostat, published as Patent applications to the EPO by priority year by NUTS 3 region, international patent classification (IPC) sections and classes (1977-2013). Statizoid refreshes it automatically from the source and publishes the full history for both places.